Magnetron sputtering is a type of physical vapor deposition used to prepare films of various materials such as metals, semiconductors, insulators, and the like. In magnetron sputtering coating, as the number of uses increases, the target is consumed, and the target base distance becomes larger. When other parameters are not changed, the coated film will gradually not meet the requirements. The uniformity of the magnetic field affects the uniformity of the film. If the magnetic field is asymmetric, it will cause the position of the coating to shift.
Provide a multifunctional magnetron sputtering coating system. This system is integrated by vacuum coating system and vacuum glove box system. It can complete thin film evaporation in high vacuum evaporation chamber and high purity inert gas atmosphere, the samples are stored, prepared, and tested after evaporation. The combination of evaporation coating and glove box realizes the fully enclosed production of evaporation, packaging, and testing processes, so that the entire film growth and device preparation process is highly integrated in a complete controllable environment atmosphere system, eliminating the organic large area circuit preparation The influence of unstable factors in the atmospheric environment guarantees the preparation of high-performance, large-area organic optoelectronic devices and circuits.
The multi-purpose magnetron sputtering coating system is mainly used for preparing various metal films, semiconductor films, dielectric films, magnetron films, optical films, superconducting films, sensing films and functional films with special needs.
