Atto10 is a proven, robust and versatile design standard solution. The system can be operated manually and automatically and has a wide range of deposition instrument options including: electron beam evaporators, RF and DC sputtering sources, low temperature organic evaporators and metal evaporators. There are also many system options available, such as quartz crystal monitoring, high vacuum load lock and heating, cooling, rotating or static sample stage.
The system has high vacuum pressure and evacuation time tests. Industry software control systems with advanced programming capabilities, system flexibility, they can be configured as sputtering systems, electron beam systems, OLED systems, thermal evaporation systems or any combination of these processes. A variety of optical and spectroscopic techniques can be integrated and the system integrated into a research glove box that requires an inert atmosphere.
Features
Multi-station glove box purification protection system
Water oxygen content
Germany Baode solenoid valve modular design, excellent sealing performance
European process requirements
Wide pressure range to 10 -9 Torr
Low exhaust
Excellent film uniformity and deposition rate
Efficient sputtering target utilization
Excellent target management mechanism eliminates the need for thermal paste, management staff, etc.
Compact, modular magnet array
Magnet is not exposed to vacuum, magnet is not exposed to cooling water
During target replacement, the cooling water will not be exposed to the vacuum chamber
Unbalanced operation and compatibility with magnetic materials are available
Full range of accessories (ventilation, chimneys, shutters, cluster arrays, etc.)
Custom sputtering source configuration available
Applications
In the semiconductor industry, MOCVD technology, microelectronic semiconductors, OLED / PLED development and production, lithium ion battery development and production, nanomaterial research, catalyst research, and research and development of perovskite solar cells
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