| Model | ATTO – 3 | |
| Main vacuum chamber | Square front door structure, size: ø300 X 400mmmm; | |
| Sample room (optional) | Open door structure, the size is about ø200 X 300mm | |
| Vacuum system configuration | Main vacuum chamber | Compound molecular pump, mechanical pump, pneumatic gate valve |
| Sample room | Mechanical pump, molecular pump, valve | |
| Ultimate pressure | Main vacuum chamber | ≤6. 67×10-5pa(After baking and degassing) |
| Sample room | ≤6.67X10-4 pa(After baking and degassing) | |
| Recovery vacuum time | Main vacuum chamber | 6. 6×10-4 pa Pa can be achieved in 30 minutes((The system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) |
| Sample room | 6.6×10-3 Pa can be achieved in 30 minutes(The system is exposed to the atmosphere for a short time and filled with dry nitrogen to start pumping) | |
| Magnetron target assembly | 2-4 sets of permanent magnet targets; target size ø60mm (one of which can be sputtered magnetic material); each target is compatible with RF sputtering and DC sputtering; water cooling inside the target; three targets can be folded towards the center of the sample above The distance from the sample is 90 ~ 110mm; each target is equipped with a pneumatic baffle. | |
| Substrate heating stage | Sample size | ø2 inch |
| Exercise method | The substrate can rotate continuously, Rotating speed 0-30rpm | |
| heating | Substrate heating temperature 600℃±1℃ | |
| Bezel form | Imported SMC corner cylinder control | |
| Process gas system | Mass flow controller 2-4 | |
| * Optional parts | Injection chamber magnetron target assembly | Permanent magnet target, target size ø 60mm。 |
| Thickness meter | Domestic / import | |
| Quiet air pump | Oil-free lubrication | |
| Computer control system | Automatic control, process reading, parameter setting, real-time monitoring and other functions | |
| Equipment Area | Host | 1800X1200mm2 |
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