Magnetron sputtering method achieves high speed, low temperature and low damage. Because high-speed sputtering is performed under low pressure, the ionization rate of the gas must be effectively increased. Magnetron sputtering introduces a magnetic field on the surface of the target cathode and uses the magnetic field to confine the charged particles to increase the plasma density to increase the sputtering rate.
However, the existing sputtering coating equipment has some defects in the use process, for example, the coating is not uniform, and the vacuum operation is not used, bubbles are prone to occur after coating on the object or the coating is unstable, resulting in a low pass rate of the coating .
Provide a sputtering coating device that can maintain vacuum. This system is integrated by a vacuum coating system and a glove box system, which can complete thin film evaporation in a high vacuum evaporation chamber, and in a glove box with high purity inert gas atmosphere The storage and preparation of samples and the detection of samples after vapor deposition are carried out. The combination of evaporation coating and glove box realizes the fully enclosed production of evaporation, encapsulation, testing and other processes, so that the entire film growth and device preparation process is highly integrated in a complete controllable environment atmosphere system, eliminating the organic large-area circuit preparation process The influence of unstable factors in the atmospheric environment guarantees the preparation of high-performance, large-area organic optoelectronic devices and circuits. A sputtering coating device that can maintain vacuum is scientific and reasonable in structure, safe and convenient to operate. It uses sputter coating to coat objects. It has the advantages of simple equipment, easy control, large coating area and strong adhesion; ensuring coating work. The area is in a vacuum state, which makes the coating operation of the object more stable, and there will be no bubbles and other phenomena on the surface of the object after coating.
