In magnetron sputtering coating, as the number of uses increases, the target is consumed, and the target base distance becomes larger. When other parameters are unchanged, the coated film will gradually not meet the requirements. The uniformity of the magnetic field affects the uniformity of the film. If the magnetic field is asymmetric, it will cause the position of the coating to shift.
In view of this, a multifunctional magnetron sputtering coating system for improving the uniformity and stability of magnetron sputtering coating is provided. This system is integrated by a vacuum coating system and a vacuum glove box system, and can be used in a high vacuum evaporation chamber. Thin film evaporation is completed in the chamber, and the samples are stored, prepared, and the samples are tested after evaporation in a high purity inert gas atmosphere in the glove box. The combination of evaporation coating and glove box realizes the fully enclosed production of evaporation, packaging, and testing processes, so that the entire film growth and device preparation process is highly integrated in a complete controllable environment atmosphere system, eliminating the organic large area circuit preparation The influence of unstable factors in the atmospheric environment guarantees the preparation of high-performance, large-area organic optoelectronic devices and circuits.
The multi-purpose magnetron sputtering coating system is mainly used to prepare various metal films, semiconductor films, dielectric films, magnetron films, optical films, superconducting films, sensing films and functional films with special needs.
