The sputtering method has a fast deposition rate, and the obtained film has the characteristics of good density and high purity, and is widely used in the industry. However, the existing sputtering thin film deposition system completes the heating, deposition, and cooling of the substrate in a chamber, which is often inefficient, and the film deposition is uneven, and equipment maintenance is troublesome. In addition, the prior art does not consider the influence of the cooling temperature on the film layer after film deposition.
Provide a vacuum coating system, this system is integrated by the vacuum coating system and the vacuum glove box system, can complete the film evaporation in the high vacuum evaporation chamber, and the sample storage in the glove box high purity inert gas atmosphere , Preparation and testing of samples after evaporation.
The combination of evaporation coating and glove box realizes the fully enclosed production of evaporation, encapsulation, testing and other processes, so that the entire film growth and device preparation process is highly integrated in a complete controllable environment atmosphere system, eliminating the organic large-area circuit preparation process The influence of unstable factors in the atmospheric environment guarantees the preparation of high-performance, large-area organic optoelectronic devices and circuits.
