In the existing coating process, the operator puts the cleaned workpiece on the stage of the coating equipment that has been balanced with the external pressure, and then the airtight coating equipment starts to vacuum. When the vacuum of the coating equipment reaches a certain negative pressure, That is, the heating seat in the coating equipment heats the substrate and coats it by sputtering or electron beam evaporation. After the entire coating process is completed, the vacuum state is released and the coated workpiece is taken out, and the next workpiece is replaced and repeated perform the above process. In such a coating process, the workpiece may be contaminated when it enters the coating equipment after cleaning. Second, it takes a lot of time to wait for the vacuum to reach the predetermined negative pressure, so batches produce cannot be performed.
Therefore, a multi-functional magnetron sputtering coating system is provided. This system is integrated by a vacuum coating system and a vacuum glove box system, which can complete thin film evaporation in a high vacuum evaporation chamber, and in a vacuum glove box with high purity The storage and preparation of samples and the detection of samples after evaporation are carried out under inert gas atmosphere. The main purpose of the multifunctional magnetron sputtering coating system: used to prepare various metal films, semiconductor films, dielectric films, magnetron films, optical films, superconducting films, sensing films and various special functional films.
